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Sputtering of thin conductive layers
Sloboda, Alexander ; Vaněk, Jiří (referee) ; Zatloukal, Miroslav (advisor)
This bachelor’s thesis is focused on the issues of thin films, especially thin transparent conductive films, and their deposition on substrate surface. Methods of deposition, their pros and cons, construction of the NP12 sputtering device, fundamentals of a deposition of thin conductive films, using reactive magnetron sputtering, preparation of substrates before deposition and thermal processing of substrates after deposition are issues that are described in this thesis. Instruction manual for magnetron sputtering device NP12 was created. For the purpose of this thesis several samples were prepared by magnetron sputtering device NP12 with different process parameters. These experimentally created samples were evaluated with the help of XRD measurement, to determine the influence of annealing in a vacuum oven on a crystal lattice. Substrates were also analysed by scanning electron microscope to evaluate presence of chemical elements inside the thin films.
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Sputtering of thin conductive layers
Sloboda, Alexander ; Vaněk, Jiří (referee) ; Zatloukal, Miroslav (advisor)
This bachelor’s thesis is focused on the issues of thin films, especially thin transparent conductive films, and their deposition on substrate surface. Methods of deposition, their pros and cons, construction of the NP12 sputtering device, fundamentals of a deposition of thin conductive films, using reactive magnetron sputtering, preparation of substrates before deposition and thermal processing of substrates after deposition are issues that are described in this thesis. Instruction manual for magnetron sputtering device NP12 was created. For the purpose of this thesis several samples were prepared by magnetron sputtering device NP12 with different process parameters. These experimentally created samples were evaluated with the help of XRD measurement, to determine the influence of annealing in a vacuum oven on a crystal lattice. Substrates were also analysed by scanning electron microscope to evaluate presence of chemical elements inside the thin films.
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Reactive Magnetron Sputtering of the Aluminium Oxide Coating
Dušek, Jan
This contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion.
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Hydrogen plasma treatment of ZnO thin films
Chang, Yu-Ying ; Neykova, Neda ; Stuchlík, Jiří ; Purkrt, Adam ; Remeš, Zdeněk
ZnO is an attractive wide band gap semiconductor with large exciton binding energy, high refractive index, high biocompatibility and diversety of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. We study the effect of hydrogen plasma treatment of the nominally undoped ZnO thin film deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma. The SEM images show that the crystal size increases with film thickness. We confirm, that the electrical conductivity significantly increases after hydrogen plasma treatment by 4 orders of magnitude. Moreover, the increase of the infrared optical absorption, related to free carrier concentration, was detected below the optical absorption edge by the photothermal deflection spectroscopy.\n
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Functional thin films for applications using advanced oxidation processes
ŠRAM, Vlastimil
This diploma thesis aims to optimalization the process of magnetron sputtering and creating of thin layers for use in advanced oxidation processes. During the work was created range of TiOx layers. For this process was used physical method of sputtering called PVD. The photocatalytic activity of the deposited films was tested by degradation of organic dyes Acid Orange 7. Furthermore, the layer was analyzed on surface morphology (SEM) and the layer thickness (profilometry). Study of created layers was focused on the link between the characteristics of each layer, deposition parameters and photocatalysis properties. Based on these results, the layers were applied in a system using AOP for the decomposition of organic substances. The first chapter is devoted to a summary of existing knowledge of photocatalysis and its principles. Another chapter is devoted to the theory and methods of applying thin layers and summary of knowledge of the low-pressure discharges. In the exprimental section there are described various components of the apparatus. Furthermore, the experimental part of the work focuses on the analysis of the optimization process of applying thin layers on titanium oxide. The last chapter of the thesis contains the results of the experiments on the basis of is designed another research progress of this issue.
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